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粉末與顆粒鍍膜原子層沉積系統-Powder ALD-研發與生產型

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粉末原子層沉積系統ALD美國ALDNANOSOLUTIONS公司技術,專注于粉末顆粒表面鍍膜

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粉末原子層沉積系統 ALD

美國ALD NANOSOLUTIONS公司技術,專注于粉末顆粒表面鍍膜。


專用于在粉末、顆粒表面沉積ALD薄膜,可用于科研,生產。單批次體積從45ml~150L,滿足科研到生產的需要。可沉積氧化物,氮化物,金屬等類型薄膜。可用于鋰離子電池、催化劑、等需要粉末鍍膜的行業。

專業的粉末鍍膜原子層沉積系統,為科研與生產提供專業的解決方案。


設備沉積方法有:流化床法、滾動法、振動法。


粉末原子層沉積系統型號:

FX系列:75 or 150 mL,適用于R&D

FP系列:  500 mL / 2 L / 5 L / 10 L,適用于R&D,生產

RX系列10 or 40 mL, 適用于R&D 

RP系列: ~40L, 適用于生產

CVR系列:15L/hr to 150L/hr,適用于生產



粉末原子層沉積系統技術參數:

ALD REACTOR SYSTEMS

Fluidized
   
Bed Reactors
   
(FBR)

Rotary Reactors (Rotary)

Continuous Vibrating Reactors (CVR)

Substrate Volume

75mL to 10L per batch

10ml to 40L

15L/hr to 150L/hr

Substrate Mass
   
(Density Dependent)

75g - 12.5kg per batch

10g - 50kg per batch

15kg/hr to 150kg/hr

Vapor Draw Sources

2 standard,
   
up to 8

2 standard,
   
up to 8

2 standard,
   
up to 8

Regulatory Compliance

CE, GMP and ISO compliance upon request

Weight

300 lbs -
   
1,000 lbs (150kg - 500kg)

300lbs - 4,000lb (150kg
   
- 2000kg)

500lbs - 8,000lb (250kg - 4000kg)

Venting  Emissions and   Abatement

Equipment can be designed to comply with local jurisdiction   codes and regulations

Electrical Requirements

Project-specific and customized. Further details can be   supplied upon request

Demonstrated Particle Diameters

10 nm - 500micron

10 nm - 200micron

5-50micron

Potential  Particle   Diameters

2 nm - 1mm

2 nm - 250px

10nm - 1 cm

Other Features

Highest Precursor Efficiency

Plasma ALD Compatible

Atmospheric Pressure Operation


Fluidization Reactor – Experimental Series (FX)

Reactor Style:

Fluidization Reactor

Substrate Volume:

75 or 150 mL

Reactor Temperatures Range:

25 – 450 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 4

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

300 lbs/ 140 kg

Options Available:

Substrate Loading

Low Vapor Pressure Containers capable of   150 °C

Residual Gas Analyzer

Waste Abatement

Glovebox

Research License for ALD on Particles

Various Vapor Sources


Fluidization Reactor – Pilot Series (FP)

Reactor Style:

Fluidization Reactor

Substrate Volume:

500 mL / 2 L / 5 L / 10 L

Reactor Temperatures Range:

25 – 450 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

400 lbs/ 180 kg

Options Available:

Substrate Loading


Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Research License for ALD on Particles

Various Vapor Sources

Rotary ALD Reactor – Pilot Series (RP)

Reactor Style:

Rotary Reactor

Substrate Volume:

~40 L

Reactor Temperatures Range:

25 – 200 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

500 lbs/ 230 kg

Options Available:

Substrate Loading


Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Integrated Glovebox

Research License for ALD on Particles

Various Vapor Sources

 

Rotary ALD Reactor – Experimental Series (RX)


Reactor Style:

Rotary Reactor

Substrate Volume:

10 or 40 mL

Reactor Temperatures Range:

25 – 200 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

300 lbs/ 140 kg

Options Available:

Substrate Loading


Plasma Source from Meaglow

Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Integrated Glovebox

Research License for ALD on Particles

Various Vapor Sources





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